Dual Flow Valve
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The Diaphragm Dual-Flow Valve was developed for the pupose of preventing the disruption of particles due to the rapid influx of gases within advanced semiconductor process chambers. By being able to introduce gas into the process chamber gradually then following with maximum flow, pressure within the chamber can now be uniformly raised. Large volume chambers may also be accommodated – something that until now was difficult to achieve with conventional slow-start valves.